The Center for X-Ray Optics is a multi-disciplined research group within Lawrence Berkeley National Laboratory's (LBNL) Materials Sciences Division (MSD). Notice to users.

Precision Engineering

Building the tools that make nanoscience possible.

A high-precision stage fabricated by CXRO's Instrument Fabrication Facility

Zone plates

Diffractive lenses for a new generation of x-ray beamlines.

SEM image of a zoneplate fabricated by CXRO

Interferometry

Wavefront control with
sub-angstrom sensitivity

Null interferogram, in preparation for EUV metrology of the SEMATECH Berkeley Microfield Exposure Tool (MET)

Optical Coatings

Precision optical coatings for soft
x-ray and EUV applications worldwide.

Engineering Test Station optics

EUV Lithography

The world's highest resolution projection lithograph tool.

Demonstration of sub-16 nm patterning at the SEMATECH Berkeley Microfield Exposure Tool (MET)

EUV Mask Imaging

The world's highest performance
EUV mask inspection tool.

Comparison of SEM and AIT images of an EUV photomask

Reflectometry

The world standard for EUV and
x-ray reflectance measurements.

Engineering Test Station optics

Holography

Systematically controlling spatial
and temporal coherence in short wavelength optical systems.

Far-field diffraction pattern from a binary phase-only EUV hologram revealing the LBNL logo.

Education

Inspiring and preparing the next generation of scientists, engineers,
and educators.

Photos of Wendy Jennings and Paul Mcfall, participants in CXRO's summer education-outreach program, 2010.

Nanomagnetism

High resolution imaging of nanoscale magnetic stcutrures.

The pinning of a magnetic domain wall.

Careers

Exciting opportunities in optics, engineering, and nanofabrication.

Careers at CXRO.
The Center for X-Ray Optics

The Center for X-Ray Optics at Lawrence Berkeley National Laboratory works to further science and technology using short wavelength optical systems and techniques. We create and operate advanced experimental systems to address national needs, support research in material, life, and environmental science, and extend the forefront of semiconductor manufacturing.

News

Tailoring Magnetic Skyrmions for Next-Generation Memory

Magnetic skyrmions are nanoscale topological spin structures offering great promise for next-generation memory technologies. However, translating their promise into viable technology requires the ability to modulate skyrmion properties, and their electrical detection under ambient conditions. Partnering with researchers in Singapore we have successfully demonstrated and visualized the control of magnetic properties of skyrmions at room temperature. This was achieved by developing a novel CMOS-compatible thin film material platform enabling the bottom-up control of skyrmion properties. The visualization was achieved by the direct imaging of skyrmions using the CXRO soft x-ray microscope at ALS (BL6.1.2, XM-1). The results demonstrated the ability to modulate the size, density, and stability of skyrmions by varying the thickness of constituent layers - all while using semiconductor industry-compatible fabrication techniques. In conjunction, the world-first electrical detection (Hall effect) of ambient skyrmions was also demonstrated. This breakthrough development provides a stepping stone for realizing stable and highly scalable (10 nm and below) non-volatile memory.

Ref: A. Soumyanarayanan, M. Raju, A. L. Gonzalez Oyarce, Anthony K. C. Tan, Mi-Young Im, A. P. Petrovic, Pin Ho, K. H. Khoo, M. Tran, C. K. Gan, F. Ernult and C. Panagopoulos, Nature Materials, DOI: 10.1038/NMAT4934 (2017).

Read more news highlights

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