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Optical characterization techniques for high-performance microelectronic device manufacturing III : 16-17 October 1996, Austin, Texas / Damon DeBusk, Ray T. Chen, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ... [et al.]. -- Bellingham, Wash. : SPIE , c1996. -- ix, 218 p. : ill. ; 28 cm. -- (Proceedings / SPIE -- the International Society for Optical Engineering ; v. 2877). -- Includes bibliographical references and index. -- ISBN 0819422754 ; (BC06860076) ; https://ci.nii.ac.jp/ncid/BC06860076
Other Title(s): Optical characterization techniques for high-performance microelectronic device manufacturing 3. -- Author Heading(s): Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing (Symposium) ; DeBusk, Damon ; Chen, Ray T. ; Society of Photo-optical Instrumentation Engineers ; Semiconductor Equipment and Materials International. -- Classification(s): LCC : TK7836 ; DC22 : 621.3815/2. -- Subject Heading(s): LCSH : Integrated circuits industry -- Congresses ; LCSH : Manufacturing processes -- Congresses ; LCSH : Semiconductors -- Design and construction -- Congresses ; LCSH : Integrated circuits -- Design and construction -- Congresses ; LCSH : Semiconductors -- Testing -- Optical methods -- Congresses ; LCSH : Optical detectors -- Congresses
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