Microscopy of semiconducting materials 1991 : proceedings of the Institute of Physics conference held at Oxford University, 25-28 March 1991

書誌事項

Microscopy of semiconducting materials 1991 : proceedings of the Institute of Physics conference held at Oxford University, 25-28 March 1991

edited by A.G. Cullis and N.J. Long

(Institute of Physics conference series, no. 117)

Institute of Physics, c1991

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注記

Sponsored by the Electron Microscopy and Analysis Group of the Institute of Physics, the Royal Microscopical Society, and the Materials Research Society

Includes bibliographical references and indexes

内容説明・目次

内容説明

The seventh conference on the Microscopy of Semiconducting Materials was held at Oxford University on 25-28 March 1991. As in previous years the conference had a totally international flavour with many of the world's leading researchers present. Scientific sponsorship was provided by the Electron Microscopy and Analysis Group of the Institute of Physics, the Royal Microscopical Society and the Materials Research Society. This volume contains both the invited and contributed papers from the

目次

High resolution microscopy (9 papers). Microanalysis (10 papers). Dislocations and grain boundaries (10 papers). Processed silicon (18 papers). Metal semiconductor contacts and silicides (17 papers). Bulk gallium arsenide and other compounds (12 papers). Epitaxial layers (31 papers). Quantum wells and superlattices (21 papers). X-ray studies (8 papers). Advanced scanning microscopy techniques (24 papers). Indexes.

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