Materials for microlithography : radiation-sensitive polymers
L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984
(ACS symposium series, 266)
The Society, 1984
Radiation-sensitive polymers
Includes bibliographies and indexes
American Chemical Society 1974-